Proceedings of the 10th Workshop on Quantum Solar Energy Conversion - (QUANTSOL'98)
March 8-14, 1998, Bad Hofgastein, Austria


Grazing Incidence X-Ray Diffractometry (GIXD) Depth Profile Characterization of Multilayer Thin Film Devices

M. Nauera, K. Ernstb, W. Kauteka, and M. Neumann-Spallartb

a Laboratory for Thin Film Technology, Federal Institute for Materials Research and Testing
Unter den Eichen 87, D-12205 Berlin, Germany

b Laboratoire de Physique des Solides de Bellevue, Centre National de la Recherche Scientifique
1, Place Aristide Briand, F-92195 Meudon Cedex, France

It is demonstrated that Grazing Incidence X-Ray Diffractometry (GIXD) canbe used for depth profiling and phase characterization of multilayer thin film devices. A Bragg-Soller x-ray diffractometer system with a flat secondary monochromator and a fixed CuKα tube (Seifert XRD 3000TT) was employed at varying low incidence with fixed θ scans (Fig. 1).
As an example, semiconducting (SC) layers on transparent electrically conducting substrates (TCO) have been characterized. A typical structure was

Glass / TCO / SC1 / SC2.

The semiconducting layers, SC1 and SC2 of II-VI compounds, were synthesized by electrochemical deposition from aqueous electrolyte solutions. In such optoelectronically active rectifying devices (PV cells), SC1 was the window layer and SC2 the absorber layer. ZnTe or ZnSe served as window material, SC-1, and CdTe as absorber, SC2.
The aim of this study was to show whether subsequent growth of layers by this technique led to (i) attack (partial dissolution) of underlying layers including TCO, or (ii) interdiffusion (mixing) of layers. Finally, it served to identify very thin window layers which cannot be detected at all, or cannot be distinguished against the substrate background (TCO) by conventional XRD (θ - 2θ scans).
The GIXD investigation of a glass/SnO2/ZnSe/CdTe device is depicted in Fig. 2. The upper CdTe absorber layer was about 300 nm thick. The ZnSe window was 100 nm and the transparent conductive oxide 400 nm. A variation of the incident angle ω between 0.3ø and 3.0ø allowed to discriminate between the layer phases on the nanometer scale. At ω ~ 0.9ø, the ZnSe (111) reflex and the SnO2 (211) reflex emerged. The penetration depth of the x-ray beam was about 190 nm at this ω. The CdTe absorber signals, which show (111), (220) and (311) texture, increase and level off above ω ~ 1.5ø. At ω > 0.9, diffraction peaks due to the ZnSe layer emerged, and around ω > 2, the SnO2 substrate diffraction peaks became visible in addition. Below ω ~ 0.9, only the topmost layer consisting of CdTe leads to diffraction peaks.
Such nanometer profile diagnostic results can be correlated with data relevant for photovoltaic applications.

Fig.1 Bragg-Soller x-ray diffractometer system with a flat secondary monochromator and a fixed CuKα tube (Seifert XRD 3000TT) Fig.2 GIXD of glass / SnO2 / ZnSe / CdTe thin film device


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